UGC Approved Journal no 63975(19)

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Published in:

Volume 5 Issue 9
September-2018
eISSN: 2349-5162

UGC and ISSN approved 7.95 impact factor UGC Approved Journal no 63975

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Published Paper ID:
JETIR1809884


Registration ID:
300064

Page Number

601-606

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Title

Surface Morphological Study of Silicon Nanostructure Synthesized by Metal Assisted Chemical Etching method on Silicon Substrate

Abstract

One-dimensional nanostructures have proven to be good materials for novel nanoscale optoelectronics and high-sensitivity molecular sensors. In the past few years, silicon nanowires (SiNWs) have gained extensive attention due to its unique effects on quantum confinement for developing different applied devices, including optoelectronics, biosensors and other devices. The major function is geometric control of manufactured Silicon nanostructure including their lengths, sizes and orientations. In this article we have given the etching duration of 30 minute for the N type Si having resistivity ranges from 0.001-0.1 OhmCm. Hence, the easy and practical approach in this paper to generate Silicon nanostructures (SiNSs) has been done by the metal assisted chemical etching and there characterization is done by the field emission electron microscopy (FESEM) also the average diameter of the cage like Silicon nanostructure has been calculated by imageJ software.

Key Words

Silicon nanostructures (SiNSs), Field emission electron microscopy(FESEM), chemical etching

Cite This Article

"Surface Morphological Study of Silicon Nanostructure Synthesized by Metal Assisted Chemical Etching method on Silicon Substrate ", International Journal of Emerging Technologies and Innovative Research (www.jetir.org), ISSN:2349-5162, Vol.5, Issue 9, page no.601-606, September-2018, Available :http://www.jetir.org/papers/JETIR1809884.pdf

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2349-5162 | Impact Factor 7.95 Calculate by Google Scholar

An International Scholarly Open Access Journal, Peer-Reviewed, Refereed Journal Impact Factor 7.95 Calculate by Google Scholar and Semantic Scholar | AI-Powered Research Tool, Multidisciplinary, Monthly, Multilanguage Journal Indexing in All Major Database & Metadata, Citation Generator

Cite This Article

"Surface Morphological Study of Silicon Nanostructure Synthesized by Metal Assisted Chemical Etching method on Silicon Substrate ", International Journal of Emerging Technologies and Innovative Research (www.jetir.org | UGC and issn Approved), ISSN:2349-5162, Vol.5, Issue 9, page no. pp601-606, September-2018, Available at : http://www.jetir.org/papers/JETIR1809884.pdf

Publication Details

Published Paper ID: JETIR1809884
Registration ID: 300064
Published In: Volume 5 | Issue 9 | Year September-2018
DOI (Digital Object Identifier):
Page No: 601-606
Country: -, -, - .
Area: Engineering
ISSN Number: 2349-5162
Publisher: IJ Publication


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