• Akshada Thube
• Pranali Shelar
• Akshata Kawale
• Pranjali Jadhav

The fabrication of an integrated circuit (IC) requires a variety of physical and chemical processes performed on semiconductor (e.g., silicon) substrate. In general, the various processes used to make an IC fall into three categories: Film deposition, Lithography and semiconductor doping. According to the Moore's Law made by Intel co-founder Gordon Moore in 1965, the number of transistors on a chip doubles every two years while the costs are halved. In order to satisfy Moore’s law, the number of transistors in an integrated circuit should be doubled every two years while the chip size needs to be the same. This is made possible by the advancements in lithography process. The word lithography comes from Greek word lithos, meaning stones, and graphia, meaning to write. In case of semiconductor lithography our stones are silicon wafer and our patterns are written with light sensitive polymer called a photoresist. Lithography is the process of transferring geometrical patterns from a mask to the silicon wafer. The Importance of lithography can be stated in two ways. First, due to the large number of lithography steps needed in IC fabrication, lithography typically accounts for about 40 percent of the cost of manufacturing. Secondly, lithography tends to be the technical limiter for further advancements in feature size reduction, transistor speed and silicon area. The currently used lithography techniques are E-Beam Lithography (EBL), Dip-Pen Lithography, Nano-shaving, Electron Projection Lithography (EPL), Nano-grafting, Lithographically Induced Self-Assembly (LISA), Atom Lithography, Micro and Nano-Contact Printing, Ion Beam Lithography (IBL) and Nano-Imprint Lithography. In any lithographic process the two main figure of merits are resolution and throughput and we reviewed each of the existingtechnologywithrespecttothesefactor.Thispaper discusses the advancement in lithography process: NanoImprintlithography. [2][3][7]

Nanotechnology, imprinting, patterning, resolution, throughput, NanoImprint lithography

"ADVANCEMENTS IN LITHOGRAPHY TECHNIQUES: NANOIMPRINT LITHOGRAPHY (NIL)", International Journal of Emerging Technologies and Innovative Research (www.jetir.org), ISSN:2349-5162, Vol.6, Issue 5, page no.78-82, May 2019, Available :http://www.jetir.org/papers/JETIRCS06019.pdf

"ADVANCEMENTS IN LITHOGRAPHY TECHNIQUES: NANOIMPRINT LITHOGRAPHY (NIL)", International Journal of Emerging Technologies and Innovative Research (www.jetir.org | UGC and issn Approved), ISSN:2349-5162, Vol.6, Issue 5, page no. pp78-82, May 2019, Available at : http://www.jetir.org/papers/JETIRCS06019.pdf