• Nihar Ranjan Bhuyan
• Dr Mohan N Giriya

In this study, the structural, electrical, and optical characteristics of Na-doped NiO thin films were analysed. The bunch air-filled deposition of 0.1 M Na-doped NiO thin films at a substratum temperature of 420 °C was achieved. After analysing the XRD spectra of Na-doped NiO thin films, it was originate that these films have a monocrystalline structure with a cubic structure, with only a single (111) peak. At a concentration of 3 wt%, Na doped NiO thin films had a maximum crystallite size of 18.90 nm. When comparing undoped and Na-doped NiO thin films, the latter exhibits a higher optical transmission spectrum in the visible range. When Na was doped into the material at a concentration of 2 weight percent, the band gap energy was reduced to a minimum of 3.53 eV. With a 3 wt% mass fraction, the Urbach energy drops to as little as 0.312 eV. Electrical resistance in Na-doped NiO films is on the order of 5%. Na doping is most effective when applied in a 3 percent solution.

Na doping, thin films, NiO, TCO, spray pneumatic technique, Urbach energy, semiconductors.

"IMPACT OF NANOCRYSTALLINE OXIDE IN CRYSTALLINE SEMICONDUCTOR THIN FILMS", International Journal of Emerging Technologies and Innovative Research (www.jetir.org), ISSN:2349-5162, Vol.10, Issue 11, page no.b116-b122, November-2023, Available :http://www.jetir.org/papers/JETIR2311117.pdf

"IMPACT OF NANOCRYSTALLINE OXIDE IN CRYSTALLINE SEMICONDUCTOR THIN FILMS", International Journal of Emerging Technologies and Innovative Research (www.jetir.org | UGC and issn Approved), ISSN:2349-5162, Vol.10, Issue 11, page no. ppb116-b122, November-2023, Available at : http://www.jetir.org/papers/JETIR2311117.pdf