UGC Approved Journal no 63975(19)

ISSN: 2349-5162 | ESTD Year : 2014
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Published in:

Volume 4 Issue 10
October-2017
eISSN: 2349-5162

UGC and ISSN approved 7.95 impact factor UGC Approved Journal no 63975

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Published Paper ID:
JETIR1710096


Registration ID:
183904

Page Number

585-591

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Title

VERSATILITY OF THIN FILM AND THIN FILM DEPOSITION TECHNIQUES AND PARAMETERS

Abstract

ABSTRACT: This article reviews and explores the basic conceptions of an intensive of thin film and deposition techniques. A thin film is a layer of material ranging from fractions of a nanometer (monolayer) to several micrometers in thickness. The prime requisite for getting sensible quality thin film is that the optimization of propaedeutic conditions viz. substrate temperature, spray rate, concentration of solution etc. This is often the foremost crucial parameter because it permits management over the scale of the droplets and their distribution over the preheated substrates. The consequences of precursor, dopants, substrate temperature, post tempering treatments, concentration etc., on the physico-chemical properties of those films are given likewise. The properties of the thin film will be simply tailored by adjusting or optimizing these conditions that successively are appropriate for a specific application. The key challenges of spray paralysis are control over the morphology and composition of product particles. It has been widely applied in the past few years.

Key Words

Keywords: Thin films, Basic concepts, Deposition, Parameters, Conditions, Substrate, CVD, PVD, SPT, Applications, etc.

Cite This Article

"VERSATILITY OF THIN FILM AND THIN FILM DEPOSITION TECHNIQUES AND PARAMETERS", International Journal of Emerging Technologies and Innovative Research (www.jetir.org), ISSN:2349-5162, Vol.4, Issue 10, page no.585-591, October 2017, Available :http://www.jetir.org/papers/JETIR1710096.pdf

ISSN


2349-5162 | Impact Factor 7.95 Calculate by Google Scholar

An International Scholarly Open Access Journal, Peer-Reviewed, Refereed Journal Impact Factor 7.95 Calculate by Google Scholar and Semantic Scholar | AI-Powered Research Tool, Multidisciplinary, Monthly, Multilanguage Journal Indexing in All Major Database & Metadata, Citation Generator

Cite This Article

"VERSATILITY OF THIN FILM AND THIN FILM DEPOSITION TECHNIQUES AND PARAMETERS", International Journal of Emerging Technologies and Innovative Research (www.jetir.org | UGC and issn Approved), ISSN:2349-5162, Vol.4, Issue 10, page no. pp585-591, October 2017, Available at : http://www.jetir.org/papers/JETIR1710096.pdf

Publication Details

Published Paper ID: JETIR1710096
Registration ID: 183904
Published In: Volume 4 | Issue 10 | Year October-2017
DOI (Digital Object Identifier):
Page No: 585-591
Country: SIWAN, BIHAR, India .
Area: Physics
ISSN Number: 2349-5162
Publisher: IJ Publication


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