• Mrinal Kumar Mishra
• Arindam Phukan

This article reports a comparative study on the variation of plasma parameters like Plasma electron temperature, plasma potential and density etc. in a Double Plasma Device. Plasma here is producedin the Target section of the device by applying a discharge voltage between the electron emitting filaments (in source) and the grounded target magnetic cage. The changes in plasma parameters are monitored in two ways, first by changing position (mechanical means) of a negatively biased plate and next by change in electrical biases(electrical mean)applied to the same plate by keeping it at a fixed position inside the Target magnetic cage of the Device. It is observed that plasma parameter variation in the case of “Electrical mean” is more pronounced. That is; the bias on the plate has dominant role in controlling high energetic electron flux that come from Source to Target to cause ionization in the target section, rather than the exposure area of the target magnetic cage to trap the energetic electrons.

A Comparative Study on the Variation of Plasma Parameters by a Movable Biased Metal Plate

"A Comparative Study on the Variation of Plasma Parameters by a Movable Biased Metal Plate ", International Journal of Emerging Technologies and Innovative Research (www.jetir.org), ISSN:2349-5162, Vol.8, Issue 4, page no.59-66, April-2021, Available :http://www.jetir.org/papers/JETIR2104438.pdf

"A Comparative Study on the Variation of Plasma Parameters by a Movable Biased Metal Plate ", International Journal of Emerging Technologies and Innovative Research (www.jetir.org | UGC and issn Approved), ISSN:2349-5162, Vol.8, Issue 4, page no. pp59-66, April-2021, Available at : http://www.jetir.org/papers/JETIR2104438.pdf