UGC Approved Journal no 63975(19)
New UGC Peer-Reviewed Rules

ISSN: 2349-5162 | ESTD Year : 2014
Volume 13 | Issue 3 | March 2026

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Published in:

Volume 10 Issue 5
May-2023
eISSN: 2349-5162

UGC and ISSN approved 7.95 impact factor UGC Approved Journal no 63975

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Published Paper ID:
JETIR2305312


Registration ID:
515051

Page Number

d47-d54

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Title

Design and Simulation of a High Gain Two-Stage Op-Amp Realised in 90nm CMOS Process

Abstract

Design and Simulation of High Gain Two-Stage Operational Amplifier is essential and plays a Vital role in the Semiconductor Industry Now a days It has a Vast number of real life applications but we focused on Providing High Gain where as we require Higher Amplification Is needed. In this paper a two stage operational amplifier has been implemented using 90nm Cmos Process which operates at 1.5 V power supply and a bias current of 10μA is applied in 90 nm technology. The op-amp provides a gain of 78.9 dB, phase margin of 670, Common Mode gain of -31 dB, 103db of CMRR, an output slew rate of 34.7V/μs, the power consumption for the op-amp is 219μW for a load of 1pF

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"Design and Simulation of a High Gain Two-Stage Op-Amp Realised in 90nm CMOS Process", International Journal of Emerging Technologies and Innovative Research (www.jetir.org), ISSN:2349-5162, Vol.10, Issue 5, page no.d47-d54, May-2023, Available :http://www.jetir.org/papers/JETIR2305312.pdf

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2349-5162 | Impact Factor 7.95 Calculate by Google Scholar

An International Scholarly Open Access Journal, Peer-Reviewed, Refereed Journal Impact Factor 7.95 Calculate by Google Scholar and Semantic Scholar | AI-Powered Research Tool, Multidisciplinary, Monthly, Multilanguage Journal Indexing in All Major Database & Metadata, Citation Generator

Cite This Article

"Design and Simulation of a High Gain Two-Stage Op-Amp Realised in 90nm CMOS Process", International Journal of Emerging Technologies and Innovative Research (www.jetir.org | UGC and issn Approved), ISSN:2349-5162, Vol.10, Issue 5, page no. ppd47-d54, May-2023, Available at : http://www.jetir.org/papers/JETIR2305312.pdf

Publication Details

Published Paper ID: JETIR2305312
Registration ID: 515051
Published In: Volume 10 | Issue 5 | Year May-2023
DOI (Digital Object Identifier):
Page No: d47-d54
Country: NIRMAL, TELANGANA, India .
Area: Engineering
ISSN Number: 2349-5162
Publisher: IJ Publication


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