UGC Approved Journal no 63975(19)

ISSN: 2349-5162 | ESTD Year : 2014
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Published in:

Volume 10 Issue 9
September-2023
eISSN: 2349-5162

UGC and ISSN approved 7.95 impact factor UGC Approved Journal no 63975

7.95 impact factor calculated by Google scholar

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Published Paper ID:
JETIR2309265


Registration ID:
524620

Page Number

c590-c597

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Title

Microstructure, impact and electrical behavior of fine grained Cu-Si-(Mg, Ti) alloy after solid solution strengthening

Abstract

Solid solution strengthening generally improves the strength of the material, making it more resistant to deformation and fracture under applied loads. In this study, microstructure, impact, and electrical behavior of fine grained Cu-Si-(Mg, Ti) alloy after solid solution strengthening are studied. The impact energy, density, and electrical conductivity of the fabricated Cu-Si-(Mg, Ti) alloys were investigated. The microstructure analysis was done using optical metallurgical microscope (OM). Results indicated that magnesium and titanium induced increased precipitation of fine grains in the copper matrix, resulting to improvements of both the impact energy and electrical conductivity of the alloys, especially in the magnesium doped Cu-3Si alloy.Solution heat treatment enhanced the grain refinement and distribution in the alloy structure. This guaranteed the further increase in impact energy of the Cu-Si-(Mg, Ti) alloy, with maximum values of 34.2 J and 25.6 J, respectively. The as-cast Cu-3Si-3Mg recorded maximum electrical conductivity of 28.55 S/m. Both alloys recorded higher density at all conditions compared with the parent alloy.

Key Words

Microstructure; magnesium; titanium; impact energy; density.

Cite This Article

"Microstructure, impact and electrical behavior of fine grained Cu-Si-(Mg, Ti) alloy after solid solution strengthening", International Journal of Emerging Technologies and Innovative Research (www.jetir.org), ISSN:2349-5162, Vol.10, Issue 9, page no.c590-c597, September-2023, Available :http://www.jetir.org/papers/JETIR2309265.pdf

ISSN


2349-5162 | Impact Factor 7.95 Calculate by Google Scholar

An International Scholarly Open Access Journal, Peer-Reviewed, Refereed Journal Impact Factor 7.95 Calculate by Google Scholar and Semantic Scholar | AI-Powered Research Tool, Multidisciplinary, Monthly, Multilanguage Journal Indexing in All Major Database & Metadata, Citation Generator

Cite This Article

"Microstructure, impact and electrical behavior of fine grained Cu-Si-(Mg, Ti) alloy after solid solution strengthening", International Journal of Emerging Technologies and Innovative Research (www.jetir.org | UGC and issn Approved), ISSN:2349-5162, Vol.10, Issue 9, page no. ppc590-c597, September-2023, Available at : http://www.jetir.org/papers/JETIR2309265.pdf

Publication Details

Published Paper ID: JETIR2309265
Registration ID: 524620
Published In: Volume 10 | Issue 9 | Year September-2023
DOI (Digital Object Identifier):
Page No: c590-c597
Country: Awka, Anambra, Nigeria .
Area: Engineering
ISSN Number: 2349-5162
Publisher: IJ Publication


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